Photosensitive polymers are resins that form the main component of the photoresists used in the photolithography process to copy a semiconductor’s circuit pattern onto a wafer. With their low metal and impurity contents, MCG Group’s Lithomax products meet the high quality required for the miniaturization of semiconductor circuits and are used by many photoresist manufacturers. With ArF and EUV photoresists — a still growing market dominated by Japanese manufacturers — holding the key to further miniaturization, the demand for Lithomax as raw materials is expected to steadily grow in future.
Mitsubishi Chemical Group will expand its Lithomax production for ArF and EUV photoresists by building a new facility in Japan.
This addition will more than double their production capacity for ArF photoresists and initiate mass production of EUV photoresists.
The new facility supplements their current production at the Kanto-Tsurumi Plant in Yokohama.
In response to this anticipated increase in demand and to strengthen the supply chain, MCG Group has decided to establish a new production facility for Lithomax at its Kyushu-Fukuoka Plant to supplement the current production at the Kanto-Tsurumi Plant in Yokohama, Kanagawa. This will more than double the production capacity of Lithomax for ArF photoresists, and also signal the start of mass production of Lithomax for EUV photoresists.
With a wide range of materials and services to support semiconductor manufacturing, MCG Group will continue to contribute to the industry with a stable, high quality supply.
Note: The content of this press release has not been edited by Fibre2Fashion staff.
Fibre2Fashion News Desk (HU)
